XJP-607 Industrial Metallurgical microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry. Used as an advanced Metallurgical microscope, the user can experience its super performance when using it.It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds and observe thicker specimen. High quality and reliable optical system brings much clearer and contrast image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.
Viewing Head | Compensation Free Trinocular Head, Inclined 30°(50mm-75mm) | ||
Eyepiece | WF10×/25mm WF10×/20mm,crosshair with reticule 0.1mm | ||
Objective | Long working distance bright and dark field Infinite Plan objectives: 5×/0.1B.D/W.D.29.4mm,10×/0.25B.D/W.D.16mm 20×/0,40B.D/W.D.10.6mm,40×/0.60B.D/W.D.5.4mm | ||
Nosepiece | Quintuple Nosepiece with DIC Jack | ||
Stage | Double layer mechanical stage Stage Size: 190mm×140mm Moving Range:50mm×40mm | ||
Filter | Flashboard type Filters (green,blue,neutral) | ||
Condenser | N.A.1.25 Abbe Condenser with iris diaphragm and filter | ||
Focusing | Coaxial coarse &fine focusing adjustment with rack and pinion mechanism.Fine focusing scale value 0.002mm | ||
Light Source | With aperture iris diaphragm and field iris diaphragm, halogen Bulb 12V/50W,AC85V-230 Brightness Adjustable | ||
Polarizing Device | Analyzer rotatable 360,°Polarizer&Analyzer can be moved in/out of the opticalpath |