Ion Beam Etching System
Product Details:
Vacuum Techniques "Ion Beam Etching System" consist of RF Ion Beam source mounted on a high vacuum Chamber with electrical and Gas Feedthroughs fitted with auto matching network, and plasma bridge neutralizer. Modular power supply for RF ion beam . SS High Vacuum Chamber housing the RF ion beam source, water cooled target holder, Mass flow controller etc., Turbo molecular pump with control unit suitable for Corrosive gas application backed by a rotary pump to achieve vacuum in the range of 10-7 mbar. Vacuum measuring gauge with sensors for measuring from atmosphere to 10-7 mbar. Water cooled target holder with tilting facility and rotation. Mass flow controller with electronic display unit calibrated for Argon, oxygen and CF4. Manually operated throttle valve between chamber and pumping unit. Control console to house all the measuring / control unit. All components are mounted on a sturdy compact frame.